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Polycrystalline silicon (polysilicon) is a key material for semiconductor devices, such as microprocessors and memory devices. Polycrystalline silicon is typically used in the fabrication of gate electrodes, interconnection structures, and other components for semiconductor devices. As a result of the continuous scaling down of metal oxide semiconductor field effect transistors (MOSFETs) for higher device density, as well as increasing performance requirements, the gate insulating layer for MOSFETs must become thinner. The MOSFET gate insulating layer is usually formed by silicon dioxide (SiO2) or silicon oxynitride (SiON), and there is a tradeoff between the tunneling leakage current and the capacitance of the gate insulating layer, so it is desirable to form the gate insulating layer of a high dielectric constant (high-K) material. 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